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原子层沉积系统(ALD)
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原子层沉积系统(ALD)
Atomic Layer Deposition Systems
SVT Associates' NorthStar™ Atomic Layer Deposition (ALD) system is a versatile research deposition tool for thermal or energy enhanced ALD. With up to 8 precursor lines and a hot wall — cross flow deposition chamber, a wide range of applications may be performed from a single system. Sample introduction is rapid and convenient with a quick hatch or the optional load lock. The NorthStar ALD system can be interfaced with other deposition and metrology tools. Integration of in-situ metrology tools and the RoboALD software/system automation increases process reproducibility. SVTA is your source for cost effective atomic layer deposition equipment.
Atomic Layer Deposition System Applications:
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High-k Dielectrics
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Nanocoatings
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Surface Modification Layers
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Corrosion protection layers
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Moisture barrier layers
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Device Encapsulations
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MEMS
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Photonic Crystals
Atomic Layer Deposition Equipment Options:
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Load Lock for rapid sample exchange
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Plasma Component
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Ozone Delivery System
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Residual Gas Analysis — QMS
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Quartz Crystal Deposition Monitor
- In-Situ Ellipsometry
- Transfer to UHV deposition systems
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